• ttf8789
    Tantalum Pentoxide - Ta2O5
    Tantalum pentoxide is Ta2O5, also known as tantalum(V) oxide. Both orthorhombic and hexagonal phases are known. Ta2O5 is a high refractive index, low absorption material useful for coatings in the near-UV to IR spectra regions; it decomposes only at temperatures >1470 °C.
    Application: Ta2O5 is used to make capacitors in automotive electronics, cell phones, and pagers, electronic circuitry; thin-film components; and high-speed tools. In the 1990s, there was a very strong interest to do research on tantalum oxide as a high-k dielectric for DRAM capacitor applications. For example, Elpida Memory (a Japanese company making DRAM) has put in a strong effort to improve ultrathin tantalum oxide films for DRAM applications. Subsequently in the 2000s, this strong interest has dropped very significantly. It is being used in on-chip MIM capacitors for RF CMOS integrated circuits. Due to its high index of refraction, Ta2O5 has been utilized in the fabrication of the glass of many photographic lenses.
    Basic Information
    Name:Tantalum pentoxide ,Symbol:Ta2O5,Cas number: [1314-61-0], Molar Mass: 441.893 g/mol,Melting Point: 1872 °C,Solubility in water : insoluble ,Crystal Structure: --,Density @ 293 K: 6.085 g/cm3,Color:white, odorless powder

    Tantalum Pentoxide Sputtering targets (Ta2O5 Target, White color/Black colar)
    Purity--- 99.99%
    Shape--- Discs, Plate, Step (Dia ≤480mm, Thickness ≥1mm)
    Rectangle, Sheet, Step (Length ≤410mm, Width ≤310mm, Thickness ≥1mm)
    Application---Anti-reflection coatings, interference filters, UV laser applications with silicon dioxide (n = 1.48), Hard, scratch-resistant and adherent coatings, dielectrics in film capacitors, as gate insulators in large scale integrated circuits requiring low leakage voltage characteristics.
    Good news: Goodwill developed Ta2O5 sputtering target (black target) )for DC sputter..., don't need change your machine, also can got Ta2O5 thin film...
    Tantalum Pentoxide Sputtering targets (TaOx Target, Black colar)
    Purity--- 99.99%
    Shape--- Discs, Plate, Step (Dia ≤480mm,, Thickness ≥1mm)
    Rectangle, Sheet, Step (Length ≤400mm, Width ≤300mm, Thickness ≥1mm)
    Application---Anti-reflection coatings, interference filters, UV laser applications with silicon dioxide (n = 1.48), Hard, scratch-resistant and adherent coatings, dielectrics in film capacitors, as gate insulators in large scale integrated circuits requiring low leakage voltage characteristics.
    Good news: Goodwill developed Ta2O5 sputtering target for DC sputter..., don't need change your machine, also can got Ta2O5 thin film...
    Tantalum Pentoxide Sputtering targets (TaO5 Target, White color)
    Purity--- 99.99%
    Shape--- Discs, Plate, Step (Dia ≤48mm,, Thickness ≥1mm)
    Rectangle, Sheet, Step (Length ≤420mm, Width ≤300mm, Thickness ≥1mm)
    Application---Anti-reflection coatings, interference filters, UV laser applications with silicon dioxide (n = 1.48), Hard, scratch-resistant and adherent coatings, dielectrics in film capacitors, as gate insulators in large scale integrated circuits requiring low leakage voltage characteristics.
    Good news: Goodwill developed Ta2O5 sputtering target for DC sputter..., don't need change your machine, also can got Ta2O5 thin film...
    Tantalum Pentoxide Evaporation Material - Ta2O5
    Density--- 8.7 g/cm3 Purity--- 99.99%, Dark grey /white tablets or granules
    Melting point --- 1880 ℃, Vacuum pressure at 2000℃ 1 Pa, at 2200℃ 10 Pa
    Properties of thin film---
    Transmission range 400 ~ 8000 nm
    Refractive index at 550nm 2.10
    Hints on evaporation---
    Electron-beam gun.
    Evaporation temperature 2000 ℃
    Oxygen partial pressure 2-5 x 10-5 Torr
    Substrate temperature 175 - 300 ℃
    Evaporation Rate 2-5 Å/sec
    Source Container tantalum or graphite liner
    Shape--- Irregular pieces, pellet, 8-9 mm dia. x 4-5 mm thick sintered tablets,3-12 mm sintered pieces
    Dimension---3-8mm irregular pieces
    Application---Anti-reflection coatings, interference filters, UV laser applications with silicon dioxide (n = 1.48), Hard, scratch-resistant and adherent coatings, dielectrics in film capacitors, as gate insulators in large scale integrated circuits requiring low leakage voltage characteristics.
    Tantalum Pentoxide Powder
    Purity--- 99.99%
    Size --- 300mesh, 325mesh Application --- used manufacture tantalum powder, tantalum carbide,sputtering targets,evaporation materials . high pure tantalum pentoxide used for additive of optic glass or manufacture of tantalate crystal.
    Relation products:
    Tantalum Metal targets
    Tantalum Boride Sputterng target
    Tantalum Carbde sputtering target
    Tantalum Nitride sputtering target
    Tantalum Pentoxide sputtering target, Ta2Ox target
    Tantalum Pentoxide +Titanium Dioxide(Ta2O5+TiO2)
    Tantalum DisSilicide Sputtering Target - TaSi2
    Tantalum Sulfide - TaS2
    Tantalum Selenide - TaSe2
    Tantalum Telluride - TaTe2
    Silicon Dioxide sputtering target,
    Strontium Titanate sputtering target
    Titanium Dioxide sputtering target, TiOx target,
    Zirconium Dioxide sputtering target - ZrOx target China Evaporation Materials
    website:http://www.goodwilltarget.com/evaporation-materials/
    Tantalum Pentoxide - Ta2O5
    Tantalum pentoxide is Ta2O5, also known as tantalum(V) oxide. Both orthorhombic and hexagonal phases are known. Ta2O5 is a high refractive index, low absorption material useful for coatings in the near-UV to IR spectra regions; it decomposes only at temperatures >14...See more
    Nov 8
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